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InAs quantum dot site selective growth on GaAs substrates

InAs quantum dot site selective growth on GaAs substrates
Autor: J. Hendrickson, M. Helfrich, M. Gehl, D. Hu, D. Schaadt, S. Linden, M. Wegener, H.M. Gibbs, and G. Khitrova
Quelle: Phys. Stat. Sol. (c) 8, 1242 (2011)
Datum: 1.2.2011


Photoluminescence (PL) spectra and AFM measurements of InAs quantum dots grown in a site-selective manner on pre-patterned GaAs substrates are presented. A number of processing steps are described including a Ga-assisted deoxidation step to remove native oxides from the sample surface. Furthermore, post growth annealing is shown to be a promising technique for improving the quantum dot density and likelihood of single site-selective nucleation. Morphological transitions are shown to occur during the annealing process with two initial quantum dots in a given nucleation site transforming into one slightly larger quantum dot. Density measurements performed by AFM combined with PL spectroscopic measurements show that we have achieved optically active, site-selective dot growth, and additionally allow us to calculate that our site-selective dots are on average 30% as efficient as unpatterned dots.