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Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography

Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography
Author: J. Fischer and M. Wegener links:
Source:
Adv. Mater. 24, OP65 (2012)
Date: 08.03.2012

Abstract:

To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.