In-situ local temperature measurement during three-dimensional direct laser writing
J.B. Mueller, J. Fischer, Y.J. Mange, T. Nann, and M. Wegener
Appl. Phys. Lett. 103, 123107 (2013)
- Date: 17.09.2013
We present an approach to measure in situ the local temperature increase in the exposed volume during three-dimensional direct laser writing. The method is based on the detection of luminescence from NaYF4:Yb3+, Er3+ co-doped nanocrystals in a confocal scheme. We found the temperature increase to be below a few K within the normal writing regime. If the photoresist is overexposed, significant temperature changes of several hundred K can be observed.