Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography
- Author: J. Fischer and M. Wegener
Adv. Mater. 24, OP65 (2012)
- Date: 08.03.2012
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.