The Materials Challenge in Diffraction-Unlimited Direct-Laser-Writing Optical Lithography

  • Autor:

    J. Fischer, G. von Freymann, and M. Wegener

  • Quelle: Adv. Mater. 22, 3578 (2010)
  • Datum: 24.8.2010
  • Abstract:

    Using a novel photoresist (composed of pentaerythritol triacrylate and isopropyl thioxanthone) that favors stimulated emission depletion by a π-π* transition and using a two-color two-photon excitation scheme, 65-nm wide lines are achieved. This value is limited by parasitic two-photon absorption of the continuous-wave depletion beam. It is estimated that, without this process, line widths of 30 nm are in reach.