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The materials challenge in diffraction-unlimited direct-laser-writing optical lithography

The materials challenge in diffraction-unlimited direct-laser-writing optical lithography
Author:

J. Fischer, G. von Freymann, and M. Wegener

links:
Source: Adv. Mater. 32, 3578 (2010)
Date: 24.8.2010

Abstract:

Using a novel photoresist (composed of pentaerythritol triacrylate and isopropyl thioxanthone) that favors stimulated emission depletion by a π-π* transition and using a two-color two-photon excitation scheme, 65-nm wide lines are achieved. This value is limited by parasitic two-photon absorption of the continuous-wave depletion beam. It is estimated that, without this process, line widths of 30 nm are in reach.