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Large-area magnetic metamaterials via compact interference lithography

Large-area magnetic metamaterials via compact interference lithography
Author: N. Feth, C. Enkrich, M. Wegener, and S. Linden links:
Source: Opt. Express 15, 501 (2007)
Date: 22.1.2007

Abstract:

Magnetic metamaterials with magnetic-dipole resonances around 1.2-μm wavelength are fabricated using an extremely compact and robust version of two- or three-beam interference lithography for 1D and 2D structures, respectively. Our approach employs a single laser beam at 532- nm wavelength impinging onto a suitably shaped dielectric object (roof-top prism or pyramid) – bringing the complexity of fabricating magnetic metamaterials down to that of evaporating usual dielectric/metallic coatings.The measured optical spectra agree well with theory; the retrieval reveals a negative magnetic permeability. Importantly, the large-scale sample homogeneity is explicitly demonstrated by optical experiments.